DocumentCode :
2607790
Title :
High performance electron and hole current switching in double-hetero tunnel-junction n-i-p quantum dot transistor
Author :
Fujihashi, Chugo
fYear :
2007
fDate :
2-5 Aug. 2007
Firstpage :
1174
Lastpage :
1178
Abstract :
A double-hetero tunnel-junction structure is introduced to the electron and hole current switching n-i-p type quantum dot transistor to improve its switching clearness. Previously the n-i-p type semiconductor quantum dot transistor was suggested on a first step model of an idea of electron and hole current switching including no recombination effect in a quantum dot and simply based on a homo tunnel-junction structure. Results in this paper show that there is some degree of recombination current in the homo tunnel-junction type and it is difficult to obtain an adequate clearness of switching performance, and newly introduced double-hetero tunnel-junction structure suppresses the recombination current and it gives a way to obtain a sufficient switching clearness.
Keywords :
semiconductor device models; semiconductor heterojunctions; semiconductor quantum dots; tunnel transistors; double-hetero tunnel-junction n-i-p quantum dot transistor; double-hetero tunnel-junction structure; electron current switching; hole current switching; homo tunnel-junction structure; recombination current; Charge carrier processes; Electrons; Integrated circuit technology; Quantum dots; Quantum mechanics; Radiative recombination; Spontaneous emission; Switches; Transistors; Voltage; Double-hetero tunnel-junction; Electron and hole currents; N-i-p structure; Quantum dot transistor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-0607-4
Electronic_ISBN :
978-1-4244-0608-1
Type :
conf
DOI :
10.1109/NANO.2007.4601392
Filename :
4601392
Link To Document :
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