Advances in Nanoimprint Lithography

Author

Lugli, Paolo ; Harrer, Stefan ; Strobel, Sebastian ; Brunetti, Francesca ; Scarpa, Giuseppe ; Tornow, Michael ; Abstreiter, Gerhard

Author_Institution

Inst. for Nanoelectron., Tech. Univ. Munchen, Munich

fYear

2007

fDate

2-5 Aug. 2007

Firstpage

1179

Lastpage

1184

Abstract

Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography. Our recent progress in developing a new room-temperature nanoimprint (RTNIL) tool for the sub-10-nm region is shown.

Keywords

molecular beam epitaxial growth; nanolithography; polymers; soft lithography; NIL; TUV-NIL processes; innovative epoxy-based polymer; molecular-beam epitaxy; nanoimprint lithography; temperature 293 K to 298 K; thermal and ultraviolet nanoimprinting processes; Fabrication; Lithography; Molecular beam epitaxial growth; Nanoelectronics; Nanofabrication; Nanolithography; Nanotechnology; Polymers; Thermal resistance; Throughput; isothermal imprint; nanofabrication; nanoimprint lithography; room-temperature nanoimprint lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on

Conference_Location

Hong Kong

Print_ISBN

978-1-4244-0607-4

Electronic_ISBN

978-1-4244-0608-1

Type

conf

DOI

10.1109/NANO.2007.4601394

Filename

4601394