DocumentCode
2607881
Title
Influence of band-structure on electron ballistic transport in silicon nanowire MOSFET´s: an atomistic study
Author
Nehari, K. ; Cavassilas, N. ; Autran, J.L. ; Bescond, M. ; Munteanu, D. ; Lannoo, M.
Author_Institution
UMR CNRS, Marseille, France
fYear
2005
fDate
12-16 Sept. 2005
Firstpage
229
Lastpage
232
Abstract
This work investigates the conduction band structure of silicon nanowires, its dependence with the wire width and its consequences on the electrical performances of Si nanowire-based MOSFETs working in the ballistic regime. The energy dispersions relations for Si nanowires have been calculated using a sp3 tight-binding model and the ballistic response of n-channel devices with a 3D Poisson-Schrodinger solver considering a mode space approach and open boundary conditions (NEGF formalism). Results are compared with data obtained considering the parabolic bulk effective-mass approximation, highlighting in this last case the overestimation of the Ion current, up to 60% for the smallest (1.36nm × 1.36nm Si wire) devices.
Keywords
MOSFET; Poisson equation; Schrodinger equation; ballistic transport; conduction bands; elemental semiconductors; nanowires; semiconductor device models; silicon; 3D Poisson-Schrodinger solver; NEGF formalism; Si; conduction band structure; effective-mass approximation; electrical performances; electron ballistic transport; energy dispersions; mode space approach; open boundary conditions; silicon nanowire MOSFET; sp3 tight-binding model; Ballistic transport; CMOS technology; Dispersion; Electrodes; Electrons; MOSFET circuits; Nanoscale devices; Nanostructures; Silicon; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN
0-7803-9203-5
Type
conf
DOI
10.1109/ESSDER.2005.1546627
Filename
1546627
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