DocumentCode :
2607881
Title :
Influence of band-structure on electron ballistic transport in silicon nanowire MOSFET´s: an atomistic study
Author :
Nehari, K. ; Cavassilas, N. ; Autran, J.L. ; Bescond, M. ; Munteanu, D. ; Lannoo, M.
Author_Institution :
UMR CNRS, Marseille, France
fYear :
2005
fDate :
12-16 Sept. 2005
Firstpage :
229
Lastpage :
232
Abstract :
This work investigates the conduction band structure of silicon nanowires, its dependence with the wire width and its consequences on the electrical performances of Si nanowire-based MOSFETs working in the ballistic regime. The energy dispersions relations for Si nanowires have been calculated using a sp3 tight-binding model and the ballistic response of n-channel devices with a 3D Poisson-Schrodinger solver considering a mode space approach and open boundary conditions (NEGF formalism). Results are compared with data obtained considering the parabolic bulk effective-mass approximation, highlighting in this last case the overestimation of the Ion current, up to 60% for the smallest (1.36nm × 1.36nm Si wire) devices.
Keywords :
MOSFET; Poisson equation; Schrodinger equation; ballistic transport; conduction bands; elemental semiconductors; nanowires; semiconductor device models; silicon; 3D Poisson-Schrodinger solver; NEGF formalism; Si; conduction band structure; effective-mass approximation; electrical performances; electron ballistic transport; energy dispersions; mode space approach; open boundary conditions; silicon nanowire MOSFET; sp3 tight-binding model; Ballistic transport; CMOS technology; Dispersion; Electrodes; Electrons; MOSFET circuits; Nanoscale devices; Nanostructures; Silicon; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN :
0-7803-9203-5
Type :
conf
DOI :
10.1109/ESSDER.2005.1546627
Filename :
1546627
Link To Document :
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