DocumentCode
2608012
Title
Influence of Electrical Bias Level on 85/85 Test Results of Plastic Encapsulated 4K RAMs
Author
Peeples, John W.
Author_Institution
Failure Analysis/Reliability Engineer, NCR Corporation, West Columbia, S.C. 29169. (803) 796-9250
fYear
1978
fDate
28581
Firstpage
154
Lastpage
160
Abstract
Samples of plastic encapsulated NMOS/LSI dynamic 4K RAMs were placed on 85°C/85% R.H. tests at four (4) different bias levels. No level exceeded specification maximums. Tests were continued as long as practical to allow observation of the entire failure distribution of most of the test groups. Over 394,000 actual device hours were accumulated. Detailed failure analysis was performed on all failures to allow for proper censoring of life test data. Censored failure mechanisms included mobile ionic contamination, package lead corrosion and plating, electrical overstress (mishandling), tester error, and in several cases, electroplating of gold from the ball bonds. Failure data representing only failures due to moisture related electrochemical corrosion of the IC aluminum metallization were analyzed. This failure mechanism accounted for 78% of the failures. Failure distributions of each test group were of lognormal nature. Three test groups were studied (Chip A/ Package 1, Chip B/Package 1 and Chip B/Package 2). Test results indicated an exponential acceleration of the failure rate with increase in electrical bias level. Bias -vs. median life curves for the three test groups examined as a composite allow for statements as to the moisture resistance characteristics of the packages and of the IC chips.
Keywords
Contamination; Corrosion; Failure analysis; Large scale integration; Life testing; MOS devices; Moisture; Packaging; Performance evaluation; Plastics;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1978. 16th Annual
Conference_Location
San Diego, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1978.362841
Filename
4208231
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