DocumentCode :
2608336
Title :
μtrench phase-change memory cell engineering and optimization
Author :
Pirovano, A. ; Pellizzer, F. ; Redaelli, A. ; Tortorelli, I. ; Varesi, E. ; Ottogalli, F. ; Tosi, M. ; Besana, P. ; Cecchini, R. ; Piva, R. ; Magistretti, M. ; Scaravaggi, M. ; Mazzone, G. ; Petruzza, P. ; Bedeschi, F. ; Marangon, T. ; Modelli, A. ; Ielmi
Author_Institution :
STMicroelectronics, Agrate Brianza, Italy
fYear :
2005
fDate :
12-16 Sept. 2005
Firstpage :
313
Lastpage :
316
Abstract :
Phase-change memory (PCM) cell is the most promising technology as post-flash nonvolatile memory (NVM). Among the different proposed cell structures, μtrench allows to simultaneously achieve low programming currents, small cell size, easy tunability and good dimensional control. Aim of this paper is to investigate the optimization and fine tuning capability of this cell architecture. Based on theoretical analysis and experimental results, the dependence of the PCM electrical parameters on the cell structure and on the geometric dimensions is assessed. An optimized μtrench cell with a programming current of 450 μA at 1.5 V and a set resistance of 5 kΩ is finally presented.
Keywords :
circuit tuning; flash memories; memory architecture; optimisation; random-access storage; 1.5 V; 450 muA; 5 kohm; electrical parameters; fine tuning capability; flash memory; nonvolatile memory; optimized μtrench cell; phase-change memory cell; Degradation; Doping; Electric resistance; Nitrogen; Nonvolatile memory; Phase change materials; Phase change memory; Research and development; Size control; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN :
0-7803-9203-5
Type :
conf
DOI :
10.1109/ESSDER.2005.1546648
Filename :
1546648
Link To Document :
بازگشت