Experimental study on formation of the micro ripple pattern on Si surface using femtosecond laser pulse

Author

Fu, Xing ; Li, Lingmei ; Geng, Na

Author_Institution

State Key Lab. of Precision Meas. Technol. & Instrum., Tianjin Univ., Tianjin

fYear

2007

fDate

2-5 Aug. 2007

Firstpage

1335

Lastpage

1338

Abstract

In this paper, the ablated patterns on Si (100) and Si (111) surfaces affected by femtosecond pulse laser are presented. The periodic structure termed ripples on silicon surface is investigated. Experiments are carried out on a femtosecond laser micromachining system with the wavelength 775 nm. Two kinds of ripples on the ablated surface are observed by SEM. Moreover, the direction of these two kinds of ripples is approximately orthogonal. The cross section image of the ablated region is showed which is cut by FIB in the orthogonal direction of the line of the center ripples. The forming process of the ripples is studied by AFM.

Keywords

atomic force microscopy; elemental semiconductors; focused ion beam technology; high-speed optical techniques; laser ablation; micromachining; scanning electron microscopy; silicon; AFM; FIB; SEM; Si; ablated surface; femtosecond laser pulse; forming process; micro ripple pattern; micromachining system; wavelength 775 nm; Acoustic beams; Laser ablation; Laser beam cutting; Laser beams; Optical pulses; Periodic structures; Semiconductor lasers; Silicon; Surface emitting lasers; Surface morphology; Femtosecond Laser; Incubation Effect; Silicon Wafer; ripple;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on

Conference_Location

Hong Kong

Print_ISBN

978-1-4244-0607-4

Electronic_ISBN

978-1-4244-0608-1

Type

conf

DOI

10.1109/NANO.2007.4601429

Filename

4601429