DocumentCode :
2608784
Title :
Direct current magnetron sputter-deposited ZnO thin films
Author :
Krishnasamy, Jegenathan ; Chan, Kah-Yoong ; Hoon, Jian-Wei ; Kamaruddin, Sharul Ashikin Binti ; Tou, Teck-Yong
Author_Institution :
Fac. of Eng., Multimedia Univ., Cyberjaya, Malaysia
fYear :
2010
fDate :
5-7 July 2010
Firstpage :
1
Lastpage :
3
Abstract :
Zinc oxide (ZnO) thin films were deposited on glass substrates at room temperature using direct current (DC) magnetron sputtering technique. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influence of the deposition pressure on structural properties of the ZnO films was investigated using atomic force microscopy (AFM). The optical properties of the ZnO films were measured using Ocean Optics spectrometer. The experimental results reveal that the deposition pressure has an important role in the structural and optical properties of the ZnO films.
Keywords :
II-VI semiconductors; atomic force microscopy; infrared spectra; light transmission; semiconductor growth; semiconductor thin films; sputter deposition; ultraviolet spectra; visible spectra; wide band gap semiconductors; zinc compounds; Ocean Optics spectrometer; ZnO; atomic force microscopy; direct current magnetron sputtering technique; optical properties; optical transmittance; pressure 12 mtorr to 25 mtorr; structural properties; temperature 293 K to 298 K; thin films; Glass; Integrated optics; Optical films; Sputtering; Substrates; Zinc oxide; DC magnetron sputtering; Structural properties and Optical properties; Zinc oxide; ZnO;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics (ICP), 2010 International Conference on
Conference_Location :
Langkawi, Kedah
Print_ISBN :
978-1-4244-7186-7
Type :
conf
DOI :
10.1109/ICP.2010.5604395
Filename :
5604395
Link To Document :
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