DocumentCode :
2609150
Title :
Base-contact proximity effects in bipolar transistors with nitride-spacer technology
Author :
Van Zeijl, Henk ; Nanver, Lis K.
Author_Institution :
Delft Inst. of Microelectron. & Submicron Technol., Netherlands
fYear :
2005
fDate :
12-16 Sept. 2005
Firstpage :
461
Lastpage :
464
Abstract :
NPN-BJT´s with spacer separated Al/Si emitter and base contacts are fabricated and characterized. Due to the proximity of the base contact to the emitter-base junction, the base current is increased by two peripheral effects: an increased, but ideal electron current to the base contact and a non-ideal current through a parasitic channel confined under the spacer. The parasitic channel is induced by a positive charge in the silicon nitride spacers that reduces the effective acceptor concentration under the spacer. With the reduction of this concentration, also the associated high-doping effects are reduced.
Keywords :
bipolar transistors; proximity effect (lithography); semiconductor doping; semiconductor junctions; silicon compounds; Al-Si; base current; base-contact proximity effects; bipolar transistors; electron current; emitter-base junction; high-doping effects; nitride-spacer technology; parasitic channel; silicon nitride spacers; Bipolar transistors; Doping; Electrodes; Electron emission; Metallization; Microelectronics; Parasitic capacitance; Proximity effect; Silicon; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN :
0-7803-9203-5
Type :
conf
DOI :
10.1109/ESSDER.2005.1546684
Filename :
1546684
Link To Document :
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