DocumentCode :
2609361
Title :
Simulation and characterization of high-frequency performances of advanced MIM capacitors
Author :
Piquet, J. ; Cueto, O. ; Charlet, F. ; Thomas, M. ; Bermond, C. ; Farcy, A. ; Torres, J. ; Flechet, B.
Author_Institution :
LAHC, Univ. de Savoie, Le Bourget du lac, France
fYear :
2005
fDate :
12-16 Sept. 2005
Firstpage :
497
Lastpage :
500
Abstract :
High-frequency simulations and characterizations of advanced metal-insulator-metal (MIM) capacitors with ultra thin 32 nm PECVD Si3N4 dielectric are presented. The frequency dependent behavior of capacitors is numerically and experimentally extracted over a wide frequency bandwidth. Numerical results are validated by comparison to experimental results. An equivalent circuit model of capacitors including four parameters is developed for a better understanding of the frequency dependent behavior. We focused on the impact of design on the performances of MIM capacitors realized on Si substrates.
Keywords :
MIM devices; copper; dielectric materials; dielectric thin films; equivalent circuits; plasma CVD coatings; silicon compounds; substrates; thin film capacitors; 32 nm; MIM capacitors; PECVD dielectric; Si3N4; equivalent circuit model; ultra thin dielectrics; Capacitance; Copper; Electrodes; Frequency dependence; Integrated circuit interconnections; MIM capacitors; Performance evaluation; Predictive models; Radio frequency; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2005. ESSDERC 2005. Proceedings of 35th European
Print_ISBN :
0-7803-9203-5
Type :
conf
DOI :
10.1109/ESSDER.2005.1546693
Filename :
1546693
Link To Document :
بازگشت