DocumentCode :
2609640
Title :
The use of Plasma Chemistry in Failure Analysis
Author :
Pfarr, Michael ; Hart, Arthur
Author_Institution :
Tegal Corporation, 528 Weddell Dr. Su. 5, Sunnyvale, CA. 94086, (408) 744-0872
fYear :
1980
fDate :
29312
Firstpage :
110
Lastpage :
114
Abstract :
Recently, low temperature plasmas of excited gasses have been used to selectively remove materials for analytical purposes. In replacing high herrperature ashing or wet chemical digestiorn, the plasma treatment has proven valuab le because of its selectivity, gentleness, cleanliness and safety. With this method, one can avoid volatile mineral losses, phase changes, trace contaminations and undesireable material loss. This process has particular applications in Failure Analysis with the removal of plastic encapsulations and passivation layers.
Keywords :
Chemicals; Contamination; Failure analysis; Minerals; Phase change materials; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Safety;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1980. 18th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1980.362924
Filename :
4208320
Link To Document :
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