DocumentCode :
2609668
Title :
Materials Analysis, An Overview
Author :
Riga, Giorgio
Author_Institution :
Fairchild Camera and Instrument, Research and Development Laboratory, 464 Ellis St. M. S. 20-709, Mountain View, Ca. 94042, (415-962-2046)
fYear :
1980
fDate :
29312
Firstpage :
121
Lastpage :
122
Abstract :
The problem of analyzing a material is considered in its generalities. The principal characteristic of a material, some of the analytical techniques used by the semiconductor industry, and the major factors affecting an analysis are briefly reviewed. Examples of the parameters that can be measured to characterize a metallic film, a semiconductor crystal, and a dielectric thin layer are reported.
Keywords :
Activation analysis; Atom optics; Crystalline materials; Dielectric materials; Magnetic analysis; Mass spectroscopy; Optical materials; Optical microscopy; Scanning electron microscopy; Semiconductor materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1980. 18th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1980.362927
Filename :
4208323
Link To Document :
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