Title :
Materials Analysis, An Overview
Author_Institution :
Fairchild Camera and Instrument, Research and Development Laboratory, 464 Ellis St. M. S. 20-709, Mountain View, Ca. 94042, (415-962-2046)
Abstract :
The problem of analyzing a material is considered in its generalities. The principal characteristic of a material, some of the analytical techniques used by the semiconductor industry, and the major factors affecting an analysis are briefly reviewed. Examples of the parameters that can be measured to characterize a metallic film, a semiconductor crystal, and a dielectric thin layer are reported.
Keywords :
Activation analysis; Atom optics; Crystalline materials; Dielectric materials; Magnetic analysis; Mass spectroscopy; Optical materials; Optical microscopy; Scanning electron microscopy; Semiconductor materials;
Conference_Titel :
Reliability Physics Symposium, 1980. 18th Annual
Conference_Location :
Las Vegas, NV, USA
DOI :
10.1109/IRPS.1980.362927