• DocumentCode
    2610020
  • Title

    UV radiation hardness of silicon inversion layer solar cells

  • Author

    Hezel, R.

  • Author_Institution
    Int. fur Werkstoffwissenschaften, Erlangen-Nuernberg Univ., Germany
  • fYear
    1990
  • fDate
    21-25 May 1990
  • Firstpage
    239
  • Abstract
    For full utilization of the high spectral response of inversion-layer solar cells in the very-short-wavelength range of the solar spectrum, sufficient ultraviolet-radiation hardness is required. In addition to the charge-induced passivation achieved by incorporating cesium into the silicon nitride AR coating, the following means for further drastic reduction of UV-light-induced effects in inversion-layer solar cells without encapsulation are introduced and interpretations are given: increasing the nitride deposition temperature, silicon surface oxidation at low temperatures, texture etching, and using higher substrate resistivities. High UV radiation tolerance and improvement of the cell efficiency can be obtained simultaneously
  • Keywords
    elemental semiconductors; radiation hardening; silicon; solar cells; Si inversion layer solar cells; UV radiation hardness; charge-induced passivation; efficiency; solar spectrum; spectral response; substrate resistivities; surface oxidation; texture etching; Coatings; Conductivity; Encapsulation; Etching; Oxidation; Passivation; Photovoltaic cells; Silicon; Surface texture; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
  • Conference_Location
    Kissimmee, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.1990.111624
  • Filename
    111624