DocumentCode
2610020
Title
UV radiation hardness of silicon inversion layer solar cells
Author
Hezel, R.
Author_Institution
Int. fur Werkstoffwissenschaften, Erlangen-Nuernberg Univ., Germany
fYear
1990
fDate
21-25 May 1990
Firstpage
239
Abstract
For full utilization of the high spectral response of inversion-layer solar cells in the very-short-wavelength range of the solar spectrum, sufficient ultraviolet-radiation hardness is required. In addition to the charge-induced passivation achieved by incorporating cesium into the silicon nitride AR coating, the following means for further drastic reduction of UV-light-induced effects in inversion-layer solar cells without encapsulation are introduced and interpretations are given: increasing the nitride deposition temperature, silicon surface oxidation at low temperatures, texture etching, and using higher substrate resistivities. High UV radiation tolerance and improvement of the cell efficiency can be obtained simultaneously
Keywords
elemental semiconductors; radiation hardening; silicon; solar cells; Si inversion layer solar cells; UV radiation hardness; charge-induced passivation; efficiency; solar spectrum; spectral response; substrate resistivities; surface oxidation; texture etching; Coatings; Conductivity; Encapsulation; Etching; Oxidation; Passivation; Photovoltaic cells; Silicon; Surface texture; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location
Kissimmee, FL
Type
conf
DOI
10.1109/PVSC.1990.111624
Filename
111624
Link To Document