DocumentCode :
2610099
Title :
Ionization, Electron Attachment And Drift In CF4
Author :
Xueli, Liu ; Xuguang, Li ; Dengming, Xiao
Author_Institution :
Dept. of Electr. Enginering, Shanghai Jiao Tong Univ., Shanghai
fYear :
2008
fDate :
9-12 Nov. 2008
Firstpage :
715
Lastpage :
717
Abstract :
This paper have measured the density-normalized effective ionization coefficients (alpha-eta)/N, (alpha and eta are the ionization and attachment coefficients, respectively) and the electron drift velocity Ve in Carbon tetrafluoride (CF4) using a pulsed Townsend technique. The overall density-normalized electric field strength E/N ranged from 50 to 250 Td (1 Td=10-17 Vcm2). From the above plots for (alpha-eta)/N, we have derived the limiting or critical field strength, (E/N)limap128 Td, which is the value of E/N at which (alpha-eta)/N=0.
Keywords :
carbon compounds; electric fields; electron attachment; ionisation; CF4; Carbon tetrafluoride; density-normalized effective ionization coefficients; density-normalized electric field strength; electron attachment; electron drift velocity; pulsed Townsend technique; Aluminum; Anodes; Cathodes; Electron mobility; Global warming; Ionization; Pulse measurements; Sulfur hexafluoride; Velocity measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Voltage Engineering and Application, 2008. ICHVE 2008. International Conference on
Conference_Location :
Chongqing
Print_ISBN :
978-1-4244-3823-5
Electronic_ISBN :
978-1-4244-2810-6
Type :
conf
DOI :
10.1109/ICHVE.2008.4774034
Filename :
4774034
Link To Document :
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