Design for Pre/main Pulsed Power Generator for EUVL Source

With the rapid development of the semiconductor chip, the lithography applied to the ICs is facing great challenges. Compared to the traditional optical lithography, extreme ultraviolet lithography (EUVL) is regarded as one of the most promising technique among the next generation lithography. Among all EUVL system, the EUV source is key issue. Compared with other light sources, the discharge produced plasma (DPP) source has drawn much attention in the recent years due to its compactness, simplicity and cost-effectiveness. In this paper, we present the configuration of a pulsed power system including the pre-pulsed power generator and main pulsed power generator according to the demand of the DDP EUVL source. The pre-pulsed power circuit based on IGBT (insulated gate bipolar transistor) was designed and various output waveforms were obtained, which demonstrate the circuit´s feasibility. Moreover, the main pulsed power generator based on the 3-stage magnetic pulse compression (MPC) was designed and the magnetic core was modeled and simulated with PSpice according to the real operational parameter, which made the selection of the circuit parameters more valid. From the simulation, it can be seen that the effect of the pulse compression is very obvious and the output pulse current exceeded 50kA with the pulse width of 250ns.