• DocumentCode
    2610460
  • Title

    CF4/O2 Plasma Accelerated Aluminum Metallization Corrosion in Plastic Encapsulated ICs in the Presence of Contaminated Die Attach Epoxies

  • Author

    Ritchie, R.Jay ; Andrews, D.Marshall

  • Author_Institution
    General Data Comm Inc, 1 Kennedy Avenue, Danbury, Connecticut 06810
  • fYear
    1981
  • fDate
    29677
  • Firstpage
    88
  • Lastpage
    92
  • Abstract
    Corrosion rates, in autoclave, of aluminum bonding pad metallization in plastic encapsulated packages were studied as a function of die attach materials. The failure rate for chlorine contaminated die attach epoxies was enhanced if the pad metallization had prior exposure to carbon tetrafluoride/oxygen plasma. Eutectically attached devices exposed to CF4/O2 demonstrated increased failure rates. These rates were found to vary with length of exposure.
  • Keywords
    Acceleration; Aluminum; Bonding; Corrosion; Metallization; Microassembly; Plasma accelerators; Plasma applications; Plasma materials processing; Plastics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1981. 19th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1981.362979
  • Filename
    4208378