DocumentCode :
2610460
Title :
CF4/O2 Plasma Accelerated Aluminum Metallization Corrosion in Plastic Encapsulated ICs in the Presence of Contaminated Die Attach Epoxies
Author :
Ritchie, R.Jay ; Andrews, D.Marshall
Author_Institution :
General Data Comm Inc, 1 Kennedy Avenue, Danbury, Connecticut 06810
fYear :
1981
fDate :
29677
Firstpage :
88
Lastpage :
92
Abstract :
Corrosion rates, in autoclave, of aluminum bonding pad metallization in plastic encapsulated packages were studied as a function of die attach materials. The failure rate for chlorine contaminated die attach epoxies was enhanced if the pad metallization had prior exposure to carbon tetrafluoride/oxygen plasma. Eutectically attached devices exposed to CF4/O2 demonstrated increased failure rates. These rates were found to vary with length of exposure.
Keywords :
Acceleration; Aluminum; Bonding; Corrosion; Metallization; Microassembly; Plasma accelerators; Plasma applications; Plasma materials processing; Plastics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1981. 19th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1981.362979
Filename :
4208378
Link To Document :
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