Title :
Reaction Kinetics of Al Films with Phosphosilicate Glass (PSG) in Semiconductors
Author_Institution :
International Business Machines Corporation, P. O. Box 390, Poughkeepsie, New York 12602
Keywords :
Annealing; Corrosion; Glass; Humidity; Kinetic theory; Life estimation; Semiconductor films; Silicon; Stability; Temperature;
Conference_Titel :
Reliability Physics Symposium, 1981. 19th Annual
Conference_Location :
Las Vegas, NV, USA
DOI :
10.1109/IRPS.1981.363000
