DocumentCode :
2611013
Title :
Symmetry reduction by surface scattering and mobility model for stressed 〈100〉/(001) MOSFETs
Author :
Bufler, F.M. ; Erlebach, A. ; Oulmane, M.
Author_Institution :
Inst. fur Integrierte Syst., ETH Zurich, Zurich, Switzerland
fYear :
2010
fDate :
6-8 Sept. 2010
Firstpage :
275
Lastpage :
278
Abstract :
It is demonstrated that the gate interface breaks the equivalence between vertical and transverse direction for the mobility in 〈100〉/(001) pMOSFETs, leading to 6 instead of 3 independent 1st order piezoconductance coefficients. This is found from Monte Carlo (MC) simulations yielding different effective mobilities for uniaxial vertical and transverse stress, which can be explained in terms of energy and parallel-momentum conservation upon specular surface scattering. A mobility model with stress-dependent 1st order piezoconductance coefficients is presented. This model is shown to reproduce well corresponding MC effective mobilities not only for low, but also for high stress.
Keywords :
MOSFET; Monte Carlo methods; carrier mobility; electric admittance; piezoresistance; semiconductor device models; semiconductor process modelling; surface scattering; Monte Carlo simulations; effective mobility model; energy conservation; gate interface; metal-oxide-semiconductor field effect transistor; parallel-momentum conservation; specular surface scattering model; stress-dependent 1st order piezoconductance coefficients; stressed pMOSFET; transverse direction mobility; uniaxial transverse stress; uniaxial vertical stress; vertical direction mobility; Logic gates; MOSFETs; Monte Carlo methods; Piezoresistance; Scattering; Silicon; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location :
Bologna
ISSN :
1946-1569
Print_ISBN :
978-1-4244-7701-2
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2010.5604508
Filename :
5604508
Link To Document :
بازگشت