• DocumentCode
    2611165
  • Title

    Stochastic modeling hysteresis and resistive switching in bipolar oxide-based memory

  • Author

    Makarov, Alexander ; Sverdlov, Viktor ; Selberherr, Siegfried

  • Author_Institution
    Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
  • fYear
    2010
  • fDate
    6-8 Sept. 2010
  • Firstpage
    237
  • Lastpage
    240
  • Abstract
    We have developed a stochastic model of the resistive switching mechanism in resistive random access memory (RRAM) based on electron hopping. The distribution of electron occupation probabilities obtained with our approach is in good agreement with previous work. In particular, a low occupation region is formed near the cathode for bipolar switching behavior or near the anode for unipolar switching behavior. This result indicates that a decrease of the switching time with increasing temperature cannot be explained only by reduced occupations of the vacancies in the low occupation region, but is related to an increase of the mobility of the oxide ions. A hysteresis cycle of RRAM switching simulated with our stochastic model is in good agreement with experimental results.
  • Keywords
    integrated circuit modelling; random-access storage; switching circuits; RRAM switching; bipolar oxide-based memory; bipolar switching; electron hopping; resistive random access memory; resistive switching; stochastic modeling hysteresis; Electrodes; Hysteresis; Ions; Random access memory; Resistance; Stochastic processes; Switches; Monte Carlo method; RRAM; resistive switching mechanism; stochastic model;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
  • Conference_Location
    Bologna
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-7701-2
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2010.5604517
  • Filename
    5604517