DocumentCode
2611165
Title
Stochastic modeling hysteresis and resistive switching in bipolar oxide-based memory
Author
Makarov, Alexander ; Sverdlov, Viktor ; Selberherr, Siegfried
Author_Institution
Inst. for Microelectron., Tech. Univ. Wien, Vienna, Austria
fYear
2010
fDate
6-8 Sept. 2010
Firstpage
237
Lastpage
240
Abstract
We have developed a stochastic model of the resistive switching mechanism in resistive random access memory (RRAM) based on electron hopping. The distribution of electron occupation probabilities obtained with our approach is in good agreement with previous work. In particular, a low occupation region is formed near the cathode for bipolar switching behavior or near the anode for unipolar switching behavior. This result indicates that a decrease of the switching time with increasing temperature cannot be explained only by reduced occupations of the vacancies in the low occupation region, but is related to an increase of the mobility of the oxide ions. A hysteresis cycle of RRAM switching simulated with our stochastic model is in good agreement with experimental results.
Keywords
integrated circuit modelling; random-access storage; switching circuits; RRAM switching; bipolar oxide-based memory; bipolar switching; electron hopping; resistive random access memory; resistive switching; stochastic modeling hysteresis; Electrodes; Hysteresis; Ions; Random access memory; Resistance; Stochastic processes; Switches; Monte Carlo method; RRAM; resistive switching mechanism; stochastic model;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location
Bologna
ISSN
1946-1569
Print_ISBN
978-1-4244-7701-2
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2010.5604517
Filename
5604517
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