DocumentCode :
2611743
Title :
Diffusivity of Moisture in Thin Films
Author :
McInerney, Edward J. ; Flinn, Paul A.
Author_Institution :
Intel Corporation, 3065 Bowers Avenue, Santa Clara, CA 95051
fYear :
1982
fDate :
30011
Firstpage :
264
Lastpage :
267
Abstract :
Absorption of moisture by thin films produces a volume increase which changes the film stress toward compression. This effect is the basis of a new technique for measuring water diffusivity. The diffusion coefficient is determined by a least squares fit of the stress data to the diffusion equation, with appropriate boundary conditions. This technique provides a fast, quantitative supplement to the traditional bias-temperature-humidity stress testing. The differences in diffusivities of common passivations are substantial; phosphosilicate glasses are orders of magnitude higher than plasma nitrides. Diffusivities for several passivation materials are given.
Keywords :
Absorption; Boundary conditions; Equations; Glass; Least squares methods; Moisture; Passivation; Stress; Testing; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1982. 20th Annual
Conference_Location :
San Diego, NV, USa
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1982.361940
Filename :
4208458
Link To Document :
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