Title :
Statistical modeling of an anisotropic lamination stack
Author :
Jarrah, A. ; Clenet, S. ; Benabou, A. ; Ramarotafika, R.
Author_Institution :
L2EP, Arts et Metiers ParisTech, Lille, France
Abstract :
The aim of this work is to study, using a statistical approach, the macroscopic behavior of a given number of anisotropic laminations, stacked randomly.
Keywords :
laminations; magnetic anisotropy; statistical analysis; anisotropic lamination stack; macroscopic behavior; statistical modeling; Anisotropic magnetoresistance; Art; Lamination; Magnetic anisotropy; Magnetic materials; Material properties; Permeability; Probability; Random variables; Tensile stress;
Conference_Titel :
Electromagnetic Field Computation (CEFC), 2010 14th Biennial IEEE Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-4244-7059-4
DOI :
10.1109/CEFC.2010.5481628
