DocumentCode :
2611925
Title :
Microscopic simulation of electron transport and self-heating effects in InAs Nanowire MISFETs
Author :
Sadi, Toufik ; Thobel, Jean-Luc ; Dessenne, François
Author_Institution :
Fachgebiet Festkorperelektronik, Tech. Univ. Ilmenau, Ilmenau, Germany
fYear :
2010
fDate :
6-8 Sept. 2010
Firstpage :
107
Lastpage :
110
Abstract :
We use a newly developed three-dimensional electrothermal Monte Carlo simulator, using finite-element meshing, to study metal-insulator field-effect transistors (MISFETs) based on a single InAs Nanowire. The model involves the coupling of an ensemble Monte Carlo simulation with the solution of the heat diffusion equation, and is carefully calibrated with data from experimental work on these devices. The simulator is applied to investigate electron transport and demonstrate the importance of self-heating in such devices characterized by high current densities.
Keywords :
III-V semiconductors; MISFET; Monte Carlo methods; indium compounds; mesh generation; nanowires; InAs; Monte Carlo simulation; electron transport; finite-element meshing; heat diffusion equation; metal-insulator field-effect transistors; microscopic simulation; nanowire MISFET; self-heating effects; Heating; Isothermal processes; Logic gates; MISFETs; Mathematical model; Monte Carlo methods; Solid modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2010 International Conference on
Conference_Location :
Bologna
ISSN :
1946-1569
Print_ISBN :
978-1-4244-7701-2
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2010.5604558
Filename :
5604558
Link To Document :
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