Title :
Investigation of transit times in SiGe structures: a Monte-Carlo approach
Author :
Hughes, D.T. ; Abram, R.A. ; Kelsall, R.W.
Author_Institution :
Dept. of Phys., Durham Univ., UK
Abstract :
Self-consistent Monte Carlo simulations of the base-collector regions of GexSi1-x/Si heterostructure bipolar transistors are discussed. High-current effects, which cause inversion of the collector field, are shown to decrease the base-collector transit time from 9.3 ps to 5.7 ps. Base and base-collector transit times are investigated for a range of Ge content in the base. The base transit time is found to decrease as the Ge content of the base is increased from 0% to 30%. The effects of the electron injection boundary conditions on transit times are studied, and it is shown that a complete knowledge of the valley occupancy on injection is unimportant for many aspects of the simulation of carriers passing through the device but that it is necessary to have a good knowledge of the momentum distribution within individual valleys
Keywords :
Ge-Si alloys; Monte Carlo methods; digital simulation; heterojunction bipolar transistors; semiconductor device models; Ge content; GexSi1-x-Si; Monte Carlo simulations; Monte-Carlo approach; base transit time; base-collector regions; base-collector transit time; electron injection boundary conditions; heterostructure bipolar transistors; momentum distribution; simulation of carriers; valley occupancy; Acoustic scattering; Bipolar transistors; Capacitive sensors; Doping; Effective mass; Germanium silicon alloys; Light scattering; Particle scattering; Photonic band gap; Silicon germanium;
Conference_Titel :
High Speed Semiconductor Devices and Circuits, 1991., Proceedings IEEE/Cornell Conference on Advanced Concepts in
Conference_Location :
Ithaca, NY
Print_ISBN :
0-7803-0491-8
DOI :
10.1109/CORNEL.1991.170004