DocumentCode :
2612207
Title :
New EPROM Data-Loss Mechanisms
Author :
Mielke, Neal R.
Author_Institution :
INTEL CORPORATION, 3065 BOWERS AVENUE, SANTA CLARA, CA. 95051
fYear :
1983
fDate :
30407
Firstpage :
106
Lastpage :
113
Abstract :
Data-loss mechanisms in present-generation EPROMs have been studied. Defect-related data loss is primarily due to interpoly-oxide defects. This is a change from the previous generation and introduces a new EPROM failure mode--column data loss. Contamination-compensation is found to be due as much to field-driven motion as to diffusion, and one result is that contaminated regions can exhibit charge gain as well as charge loss. Intrinsic charge loss is attributed to detrapping of electrons from the oxide layers rather than to loss of stored charge, suggesting that with proper screening of defects EPROM data retention is effectively unlimited.
Keywords :
Contamination; EPROM; Electron traps; Extrapolation; MOSFETs; Nonvolatile memory; Production systems; Temperature; Threshold voltage; Topology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1983. 21st Annual
Conference_Location :
Phoenix, AZ, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1983.361969
Filename :
4208490
Link To Document :
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