Title :
Electromigration-Induced Extrusions in Multi-Level Technologies
Author_Institution :
IBM E. Fishkill Facility, Hopewell Junction, NY 12533
Abstract :
It has been found that wearout failure in multilevel technologies is primarily by electromigration- induced extrusions leading to intralevel short circuits rather than by the traditionally studied open-circuit mode. Recent results are reported, with a discussion of the serious implication that this newly considered failure mode generates.
Keywords :
Circuit testing; Condition monitoring; Conducting materials; Conductive films; Diodes; Glass; Resistors; Temperature; Thin film circuits; Voltage;
Conference_Titel :
Reliability Physics Symposium, 1983. 21st Annual
Conference_Location :
Phoenix, AZ, USA
DOI :
10.1109/IRPS.1983.361985