DocumentCode :
2613856
Title :
Investigation Into GaAs Power MESFET Surface Degradation
Author :
Dumas, J.M. ; Lecrosnier, D. ; Bresse, J.F.
Author_Institution :
Centre National d´´Etudes des Télécommunications, BP 40, 22301 LANNION - France
fYear :
1985
fDate :
31107
Firstpage :
39
Lastpage :
44
Abstract :
Long term degradation of GaAs power MESFETs is shown to be surface-induced. - C.V.D. SiO2 protected FETs are investigated in part 1 : using micro-Auger analysis (beam spot size ¿0.1 - 0.2 ¿m), we have identified a Gallium outdiffusion induced by the SiO2 surface protection deposition and a GaAs oxidation mechanism during electrical operation. These reactions modify the electrical surface properties in the access regions explaining the R.F. and D.C. performances degradation. This part I constitutes the body of this communication. - part II : After a review of our results on unprotected FETs, a plasma enhanced chemical vapor deposited silicon nitride layer is shown to be a suitable passivation.
Keywords :
Chemicals; Degradation; FETs; Gallium arsenide; MESFETs; Oxidation; Plasma chemistry; Plasma properties; Protection; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1985. 23rd Annual
Conference_Location :
Orlando, FL, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1985.362072
Filename :
4208599
Link To Document :
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