• DocumentCode
    2613988
  • Title

    A Study of Resistance Variations During Electromigration

  • Author

    LaCombe, Donald J. ; Parks, Earl

  • Author_Institution
    Electronics Laboratory, General Electric Company, P.O. Box 4840, Syracuse, New York 13221
  • fYear
    1985
  • fDate
    31107
  • Firstpage
    74
  • Lastpage
    80
  • Abstract
    This paper presents the results of a detailed study of the resistance changes which occur during electromigration. The limitations of resistance monitoring techniques for evaluating susceptibility to electromigration are described. Several stages of test stripe degradation are identified and related to resistance behavior including void formation, multiplication, growth, coalescence, and healing. Arcing cross voids is identified as a potential healing mechanism.
  • Keywords
    Aluminum; Condition monitoring; Conductors; Electric resistance; Electrical resistance measurement; Electromigration; Energy measurement; Laboratories; Metallization; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1985. 23rd Annual
  • Conference_Location
    Orlando, FL, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1985.362079
  • Filename
    4208606