DocumentCode :
2614162
Title :
Effect of emitter parameter variation on the performance of heteroepitaxial indium phosphide solar cells
Author :
Jain, R.K. ; Flood, D.J.
Author_Institution :
NASA Lewis Res. Center, Cleveland, OH, USA
fYear :
1990
fDate :
21-25 May 1990
Firstpage :
1350
Abstract :
Metalorganic chemical-vapor-deposited heteroepitaxial indium phosphide solar cell performance was simulated using a PC-1D computer model. The effect of emitter parameter variation on the performance of an n+/p/p+ heteroepitaxial InP/GaAs solar cell was studied. It was observed that thin and lightly doped emitters offer higher cell efficiencies. The influence of emitter thickness and minority carrier diffusion length on the cell efficiency versus dislocation density was studied. It is shown that heteroepitaxial cells with efficiencies similar to existing efficiencies (>16% AM0) of homojunction indium phosphide cells are possible if a dislocation density lower than 106 cm-2 can be achieved. A realistic optimized design study yields indium phosphide solar cells with over 22% AM0 efficiency at 25°C
Keywords :
CVD coatings; III-V semiconductors; dislocation density; electrical engineering computing; indium compounds; semiconductor device models; solar cells; 16 percent; 22 percent; 25 degC; AM0 efficiencies; InP solar cells; InP-GaAs; PC-1D computer model; dislocation density; emitter parameter variation; heteroepitaxial indium phosphide solar cells; metalorganic CVD solar cells; n+/p/p+ heteroepitaxial InP/GaAs solar cell; Buffer layers; Computational modeling; Computer simulation; Costs; Design optimization; Gallium arsenide; Indium phosphide; MOCVD; NASA; Photovoltaic cells;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
Type :
conf
DOI :
10.1109/PVSC.1990.111831
Filename :
111831
Link To Document :
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