• DocumentCode
    2614340
  • Title

    High effective area amorphous silicon solar cell using excimer laser process

  • Author

    Nakajima, S. ; Abe, M. ; Shinohara, Hirofumi ; Arai, Y. ; Ishida, N. ; Satake, A. ; Nishi, K. ; Kugawa, S. ; Uehara, Yuji ; Ishii, M. ; Yamazaki, S.

  • Author_Institution
    Semicond. Energy Lab. Co. Ltd., Kanagawa, Japan
  • fYear
    1990
  • fDate
    21-25 May 1990
  • Firstpage
    1400
  • Abstract
    A laser patterning method for fabricating integrated-type amorphous silicon (a-Si) solar cell submodules has been investigated. An excimer laser was used to fabricate integrated-type solar cell submodules with a size of 535 cm2. By the use of the excimer laser, higher throughput and a larger effective area were obtained than with a YAG laser. These submodules had an efficiency of 8.17% under AM 1.5, 100-mW/cm2 and an effective area rate of 93.1%
  • Keywords
    amorphous semiconductors; elemental semiconductors; laser beam machining; silicon; solar cells; 8.17 percent; amorphous Si solar cells; excimer laser; laser patterning method; semiconductor; solar cell submodules; Ambient intelligence; Amorphous silicon; Electrodes; Laboratories; Laser beams; Optical pulses; Photovoltaic cells; Power lasers; Semiconductor lasers; Surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
  • Conference_Location
    Kissimmee, FL
  • Type

    conf

  • DOI
    10.1109/PVSC.1990.111840
  • Filename
    111840
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2614340