Title :
High efficiency a-Si/a-Si tandem solar cells
Author :
Shen, D.S. ; Schropp, R.E.I. ; Chatham, H. ; Hollingsworth, R.E. ; Xi, J. ; Bhat, P.K.
Author_Institution :
Glasstech Solar Inc., Golden, CO, USA
Abstract :
The authors report results on a-Si/a-Si tandem solar cells fabricated using niobium oxide (NbOx) as the recombination layer in the tunneling junction and an advanced doping gas, trimethylboron (B(CH3)3), in the p+ layer. The tunneling junction has a low series resistance and minimizes optical loss. The advantage of the NbOx layer is its high transparency; hence, a relatively thick (~10-nm) layer can be used. The ability to use a thick oxide layer is important for the implementation of the tunneling junction in the production of large-area panels. The best 1 cm2 area a-Si/a-Si tandem cell reached 10.4% conversion efficiency, as confirmed by SERI. Comparison of the effects of extended light soaking on the performance of single junction and tandem devices indicates that the tandem cells are more stable. B(CH3)3 appears to be a better doping gas than B 2H6 for the p layers in the tandem cells
Keywords :
amorphous semiconductors; elemental semiconductors; silicon; solar cells; 10.4 percent; advanced doping gas; amorphous Si-Si solar cells; extended light soaking; optical loss; recombination layer; semiconductor; tandem solar cells; tunneling junction; Charge carrier processes; Doping; Niobium compounds; Optical losses; Photoconductivity; Photovoltaic cells; Production; Spontaneous emission; Stability; Tunneling;
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
DOI :
10.1109/PVSC.1990.111853