Title : 
Evaluation of degradation in amorphous silicon solar cells
         
        
            Author : 
Redfield, David ; Bube, Richard H.
         
        
            Author_Institution : 
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
         
        
        
        
        
            Abstract : 
It is pointed out that lack of understanding of light-induced degradation in a-Si:H has prevented not only its reduction, but also its basic characterization. That is, there has been no quantitative index of material stability that can be used as a criterion of material quality, thus precluding evaluation of preparation conditions or comparative stability of different materials. From the recently developed stretched-exponential description of degradation, it is shown that the saturated behavior is the only reliable criterion, although it is little used. A recent atomic model for the metastable defects that is consistent with this description and explains most defect properties is summarized. This model is an adaptation of a model for the metastable DX centers in GaAs and differs from the usual Si-Si bond-breaking models in a-Si:H in that it is based on foreign atoms
         
        
            Keywords : 
amorphous semiconductors; elemental semiconductors; silicon; solar cells; GaAs; Si-Si bond-breaking models; amorphous Si:H; amorphous silicon solar cells; atomic model; degradation; material stability; metastable DX centers; Adaptation model; Amorphous silicon; Annealing; Degradation; Gallium arsenide; Materials science and technology; Metastasis; Photovoltaic cells; Stability criteria; Temperature;
         
        
        
        
            Conference_Titel : 
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
         
        
            Conference_Location : 
Kissimmee, FL
         
        
        
            DOI : 
10.1109/PVSC.1990.111859