DocumentCode :
2614715
Title :
Evaluation of degradation in amorphous silicon solar cells
Author :
Redfield, David ; Bube, Richard H.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
fYear :
1990
fDate :
21-25 May 1990
Firstpage :
1506
Abstract :
It is pointed out that lack of understanding of light-induced degradation in a-Si:H has prevented not only its reduction, but also its basic characterization. That is, there has been no quantitative index of material stability that can be used as a criterion of material quality, thus precluding evaluation of preparation conditions or comparative stability of different materials. From the recently developed stretched-exponential description of degradation, it is shown that the saturated behavior is the only reliable criterion, although it is little used. A recent atomic model for the metastable defects that is consistent with this description and explains most defect properties is summarized. This model is an adaptation of a model for the metastable DX centers in GaAs and differs from the usual Si-Si bond-breaking models in a-Si:H in that it is based on foreign atoms
Keywords :
amorphous semiconductors; elemental semiconductors; silicon; solar cells; GaAs; Si-Si bond-breaking models; amorphous Si:H; amorphous silicon solar cells; atomic model; degradation; material stability; metastable DX centers; Adaptation model; Amorphous silicon; Annealing; Degradation; Gallium arsenide; Materials science and technology; Metastasis; Photovoltaic cells; Stability criteria; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
Type :
conf
DOI :
10.1109/PVSC.1990.111859
Filename :
111859
Link To Document :
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