Title :
Degradation and recovery of SiGe HBTs following radiation and hot-carrier stressing
Author :
Sheng, S.R. ; McAlister, S.P. ; McCaffrey, J.P. ; Kovacic, S.
Author_Institution :
Inst. for Microstruct. Sci., Ottawa, Ont., Canada
Abstract :
Device degradation can arise though a variety of stress conditions and mechanisms. Here we focus on SiGe HBTs and effects of γ-radiation and hot-carrier stress on the DC devices characteristics, and subsequent annealing following the stress. Hot-carriers electrical stressing was performed at room temperature by applying a constant reverse-bias voltage across the BE junction, with the collector and substrate open. The radiation and hot-carrier induced changes were followed in time during annealing at room and elevated temperature.
Keywords :
Ge-Si alloys; annealing; gamma-ray effects; heterojunction bipolar transistors; hot carriers; recovery; semiconductor materials; γ-radiation effects; 293 to 298 K; SiGe; SiGe HBTs; annealing; degradation; device degradation; electrical stressing; hot-carrier stressing; recovery; room temperature; Annealing; Degradation; Diodes; Germanium silicon alloys; Heterojunction bipolar transistors; Hot carriers; Silicon germanium; Substrates; Temperature; Thermal stresses;
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
DOI :
10.1109/ISDRS.2003.1271973