• DocumentCode
    2615029
  • Title

    Controlled Surface Contamination to Determine Surface Sensitivity of HVICS

  • Author

    Osenbach, J.W. ; Comizzoli, R.B. ; Voris, S.S.

  • Author_Institution
    AT&T - Bell Laboratories, 2525 North 12th Street, Reading, Pennsylvania 19604
  • fYear
    1986
  • fDate
    31503
  • Firstpage
    239
  • Lastpage
    246
  • Abstract
    We report a technique that allows one to deposit on devices a controllable level of contamination as low as 108 atoms/cm2. Using this technique we were able to determine that surface contamination alone does not lead to reduced breakdown voltage of our high voltage PIN diodes. Good devices are essentially immune to surface contamination; however, "bad" devices are very sensitive to contamination. Contamination on the order of 1010 atoms/cm2 reduces the breakdown voltage of a defective diode by over 100V. We have proposed one possible model which describes the dependence of the breakdown voltage of a high voltage device on the applied bias, concentration of contamination, and field plate design. This model is based on the double layer theory of ionic solutions.
  • Keywords
    Atomic layer deposition; Breakdown voltage; Dielectric devices; Humidity; Passivation; Semiconductor devices; Semiconductor diodes; Silicon; Surface contamination; Surface cracks;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1986. 24th Annual
  • Conference_Location
    Anaheim, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1986.362140
  • Filename
    4208671