DocumentCode
2615029
Title
Controlled Surface Contamination to Determine Surface Sensitivity of HVICS
Author
Osenbach, J.W. ; Comizzoli, R.B. ; Voris, S.S.
Author_Institution
AT&T - Bell Laboratories, 2525 North 12th Street, Reading, Pennsylvania 19604
fYear
1986
fDate
31503
Firstpage
239
Lastpage
246
Abstract
We report a technique that allows one to deposit on devices a controllable level of contamination as low as 108 atoms/cm2. Using this technique we were able to determine that surface contamination alone does not lead to reduced breakdown voltage of our high voltage PIN diodes. Good devices are essentially immune to surface contamination; however, "bad" devices are very sensitive to contamination. Contamination on the order of 1010 atoms/cm2 reduces the breakdown voltage of a defective diode by over 100V. We have proposed one possible model which describes the dependence of the breakdown voltage of a high voltage device on the applied bias, concentration of contamination, and field plate design. This model is based on the double layer theory of ionic solutions.
Keywords
Atomic layer deposition; Breakdown voltage; Dielectric devices; Humidity; Passivation; Semiconductor devices; Semiconductor diodes; Silicon; Surface contamination; Surface cracks;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location
Anaheim, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1986.362140
Filename
4208671
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