Title :
Thermo-Mechanical Cycling Behavior of Al Thin-Film Metallization
Author :
Hieber, Hartmann ; Simon, Thore
Author_Institution :
Philips GmbH Forschungslaboratorium Hamburg, Vogt-Koelin-Str. 30, D-2000 Hamburg 54, Germany
Keywords :
Creep; Electrical resistance measurement; Metallization; Sputtering; Stress measurement; Substrates; Temperature; Thermal stresses; Thermomechanical processes; Transistors;
Conference_Titel :
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location :
Anaheim, CA, USA
DOI :
10.1109/IRPS.1986.362142