DocumentCode :
2615521
Title :
Compositional pulling effect in high Al-content AlGaN films grown on (0001) sapphire substrates
Author :
Tsai, Yu-Li ; Wang, Cheng-Liang ; Lin, Po-Hung ; Liao, Wei-Tsai ; Gong, Jyh-Rong
Author_Institution :
Dept. of Mater. Sci. & Eng., Feng Chia Univ., Taichung, Taiwan
fYear :
2003
fDate :
10-12 Dec. 2003
Firstpage :
98
Lastpage :
99
Abstract :
In this presentation, we report strain induced compositional pulling phenomenon in high Al content AlGaN films grown on AlN-coated sapphire substrates. It was found that Al constituent in a high Al content AlGaN film was expelled out of the film in the initial stage of the growth followed by the growth of a AlGaN film having higher Al content. The AlGaN films were characterized by X-ray diffractometry (XRD) for composition evaluation. Absorption spectroscopy was employed for the measurements of absorption spectra of the AlGaN films.
Keywords :
III-V semiconductors; MOCVD; X-ray diffraction; aluminium compounds; gallium compounds; semiconductor growth; semiconductor thin films; ultraviolet spectra; wide band gap semiconductors; AlGaN; AlGaN films growth; AlN-Al2O3; X-ray diffractometry; XRD; absorption spectra; sapphire substrates; strain induced compositional pulling effect; Aluminum gallium nitride; Artificial intelligence; Buffer layers; Capacitive sensors; Electromagnetic wave absorption; Light emitting diodes; Materials science and technology; Photodetectors; Substrates; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
Type :
conf
DOI :
10.1109/ISDRS.2003.1272013
Filename :
1272013
Link To Document :
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