• DocumentCode
    2615670
  • Title

    Impact of Hot Carriers on Dram Circuits

  • Author

    Duvvury, C. ; Redwine, D. ; Kitagawa, H. ; Haas, R. ; Chuang, Y. ; Beydler, C. ; Hyslop, A

  • Author_Institution
    Texas Instruments Inc., M/S 633, P.O. Box 1443, Houston, Texas 77001
  • fYear
    1987
  • fDate
    31868
  • Firstpage
    201
  • Lastpage
    206
  • Abstract
    Hot carrier stress degradation in MOSFETs is well known but its impact on DRAM circuit functionality has not been thoroughly investigated. In this paper observed DRAM degradation with stress is related to the actual transistor level degradation. It is shown here that the transistor saturation drain current is a good monitor of the DRAM Access Time, while the Precharge Time and the Refresh Time can be related respectively to degradations in the transistor´s linear drive current and the saturation region subthreshold current. As concluded in this paper, transistor parameters other than just Vt and gm need to be monitored with hot carrier stress to understand the full impact on DRAM circuit functionality.
  • Keywords
    CMOS technology; Circuits; Degradation; Drain avalanche hot carrier injection; Electron traps; Hot carriers; MOSFETs; Random access memory; Stress; Substrate hot electron injection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1987. 25th Annual
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1987.362179
  • Filename
    4208713