DocumentCode :
2615670
Title :
Impact of Hot Carriers on Dram Circuits
Author :
Duvvury, C. ; Redwine, D. ; Kitagawa, H. ; Haas, R. ; Chuang, Y. ; Beydler, C. ; Hyslop, A
Author_Institution :
Texas Instruments Inc., M/S 633, P.O. Box 1443, Houston, Texas 77001
fYear :
1987
fDate :
31868
Firstpage :
201
Lastpage :
206
Abstract :
Hot carrier stress degradation in MOSFETs is well known but its impact on DRAM circuit functionality has not been thoroughly investigated. In this paper observed DRAM degradation with stress is related to the actual transistor level degradation. It is shown here that the transistor saturation drain current is a good monitor of the DRAM Access Time, while the Precharge Time and the Refresh Time can be related respectively to degradations in the transistor´s linear drive current and the saturation region subthreshold current. As concluded in this paper, transistor parameters other than just Vt and gm need to be monitored with hot carrier stress to understand the full impact on DRAM circuit functionality.
Keywords :
CMOS technology; Circuits; Degradation; Drain avalanche hot carrier injection; Electron traps; Hot carriers; MOSFETs; Random access memory; Stress; Substrate hot electron injection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1987. 25th Annual
Conference_Location :
San Diego, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1987.362179
Filename :
4208713
Link To Document :
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