DocumentCode :
2615782
Title :
Impurity and defect centers of n-type 4H-SiC single crystals investigated by a photoluminescence and a piezoelectric photo thermal spectroscopy
Author :
Sakai, K. ; Fukuyama, A. ; Shigetomi, S. ; Ikari, T.
Author_Institution :
Frontier Sci. Res. Center, Miyazaki Univ., Japan
fYear :
2003
fDate :
10-12 Dec. 2003
Firstpage :
128
Lastpage :
129
Abstract :
The deep defect level in n-type 4H-SiC single crystal were investigated from the two physical viewpoints of non-radiative and radiative recombination by using PPT and PL techniques, respectively. Three peaks appear at 2.10, 2.35 and 2.80 eV in the PL spectra and two broad peaks appear around 2.2 and 2.7 eV in the PPT spectra. These were explained by the electron transition through impurity and a defect levels with a phonon relaxation process in terms of the CC model. The strong electron-lattice interaction in the electron transition is understood by those two high sensitivity techniques.
Keywords :
deep levels; impurities; nonradiative transitions; phonons; photoluminescence; photothermal effects; silicon compounds; wide band gap semiconductors; SiC; deep defect levels; defect centers; electron radiative transition; electron-lattice interaction; impurities; n-type 4H-SiC single crystals; nonradiative transition; phonon relaxation; photoluminescence; piezoelectric photo thermal spectra; Crystals; Electrons; Impurities; Nitrogen; Photoluminescence; Radiative recombination; Silicon carbide; Spectroscopy; Temperature; Thermal engineering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
Type :
conf
DOI :
10.1109/ISDRS.2003.1272027
Filename :
1272027
Link To Document :
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