• DocumentCode
    2617403
  • Title

    Mobility of (112~0) and (0001) orientated 4H-SiC quantized inversion layers

  • Author

    Pennington, Gary ; Goldsman, Neil ; McGarrity, James M. ; Lelis, Aivars ; Scozzie, Charles J.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Maryland Univ., College Park, MD, USA
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    338
  • Lastpage
    339
  • Abstract
    The paper investigates the effects of the inversion layer quantization at the SiO2-4H-SiC interface for the (0001) and (112~0) crystalline orientations. Monte Carlo simulations of electron transport show that the mobility does decrease as a direct result of the reduction of interface traps at the (112~0) surface. In inversion layer the bulk band edges is split into subband levels perpendicular to the oxide interface. These levels are calculated for 4H-SiC self-consistently using the Hartree approximation. The paper also presents the comparison results of Monte Carlo simulation and experimental data for (0001) 4H-SiC.
  • Keywords
    Monte Carlo methods; SCF calculations; band structure; crystal orientation; electron mobility; interface states; inversion layers; silicon compounds; wide band gap semiconductors; (0001) crystalline orientations; 4H-SiC inversion layers; Hartree approximation; Monte Carlo simulation; SiO2-SiC; electron mobility; electron transport; interface traps; inversion layer quantization effects; self-consistent field calculations; Brillouin scattering; Crystallization; Electron mobility; Electron traps; MOSFETs; Military computing; Rough surfaces; Silicon carbide; Surface fitting; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1272122
  • Filename
    1272122