DocumentCode :
2618385
Title :
Silicon nano-devices and single-electron devices
Author :
Takahashi, Yasuo ; Ono, Yukinori ; Fujiwara, Akira ; Nishiguchi, Katsuhiko ; Inokawa, Hiroshi
Author_Institution :
NTT Basic Res. Lab., NTT Corp., Atsugi, Japan
fYear :
2003
fDate :
10-12 Dec. 2003
Firstpage :
448
Lastpage :
449
Abstract :
Recent progress in CMOS LSI fabrication technology made possible to achieve nanometre-size silicon device. The devices should operate with CMOS transistors to efficiently use high sophisticated CMOS technologies. To achieve high functionality, especially using silicon as a base the difficulty arises in making the coherent length sufficiently longer than the device size. Another candidate is a single-electron transistor (SET), which does not use coherency. The device manipulates a single electron by means of a Coulomb blockade. Fabricating SETs using Si MOS process has been useful in overcoming because SETs were combined with MOSFET. This allows to emphasize the special functionality of SETs like multiple-valued operation, and high voltage gain.
Keywords :
CMOS integrated circuits; Coulomb blockade; MOSFET; elemental semiconductors; large scale integration; nanoelectronics; silicon; single electron transistors; CMOS LSI fabrication technology; CMOS transistors; Coulomb blockade; MOSFET; Si MOS process; silicon; silicon nanodevices; single electron devices; single electron transistor; CMOS logic circuits; CMOS technology; Fabrication; MOSFETs; Nanoscale devices; Oxidation; Silicon; Single electron devices; Voltage; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
Type :
conf
DOI :
10.1109/ISDRS.2003.1272179
Filename :
1272179
Link To Document :
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