• DocumentCode
    2618385
  • Title

    Silicon nano-devices and single-electron devices

  • Author

    Takahashi, Yasuo ; Ono, Yukinori ; Fujiwara, Akira ; Nishiguchi, Katsuhiko ; Inokawa, Hiroshi

  • Author_Institution
    NTT Basic Res. Lab., NTT Corp., Atsugi, Japan
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    448
  • Lastpage
    449
  • Abstract
    Recent progress in CMOS LSI fabrication technology made possible to achieve nanometre-size silicon device. The devices should operate with CMOS transistors to efficiently use high sophisticated CMOS technologies. To achieve high functionality, especially using silicon as a base the difficulty arises in making the coherent length sufficiently longer than the device size. Another candidate is a single-electron transistor (SET), which does not use coherency. The device manipulates a single electron by means of a Coulomb blockade. Fabricating SETs using Si MOS process has been useful in overcoming because SETs were combined with MOSFET. This allows to emphasize the special functionality of SETs like multiple-valued operation, and high voltage gain.
  • Keywords
    CMOS integrated circuits; Coulomb blockade; MOSFET; elemental semiconductors; large scale integration; nanoelectronics; silicon; single electron transistors; CMOS LSI fabrication technology; CMOS transistors; Coulomb blockade; MOSFET; Si MOS process; silicon; silicon nanodevices; single electron devices; single electron transistor; CMOS logic circuits; CMOS technology; Fabrication; MOSFETs; Nanoscale devices; Oxidation; Silicon; Single electron devices; Voltage; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1272179
  • Filename
    1272179