DocumentCode
2619282
Title
Suspended waveguides for InP optical MEMS
Author
Kelly, D. ; Pruessner, M.W. ; Datta, M. ; Ghodssi, R.
fYear
2003
fDate
10-12 Dec. 2003
Firstpage
496
Lastpage
497
Abstract
In this paper, the design, fabrication, and testing of a monolithically fabricated suspended waveguide for use in InP waveguide MEMS was presented. All layers are grown using Molecular Beam Epitaxy (MBE) and are lattice matched to the InP substrate wafer. The single-mask process was used to fabricate complex and intricate optical MEMS structures in the material system. A Newport AutoAlign optical setup consisting of two movable conical-tipped fibers and a stationary waveguide stage was used to test the fabricated waveguides using relative power measurements.
Keywords
III-V semiconductors; indium compounds; masks; micromechanical devices; molecular beam epitaxial growth; optical waveguides; semiconductor epitaxial layers; semiconductor growth; InP; InP optical MEMS; MBE; conical tipped fibers; molecular beam epitaxy; monolithically fabricated suspended waveguide; optical MEMS structures; single mask process; Indium phosphide; Lattices; Micromechanical devices; Molecular beam epitaxial growth; Optical device fabrication; Optical fiber testing; Optical materials; Optical waveguides; Power measurement; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2003 International
Print_ISBN
0-7803-8139-4
Type
conf
DOI
10.1109/ISDRS.2003.1272225
Filename
1272225
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