Title :
Creation of adhesion resistant silica glass surfaces with ultraviolet laser cleaning
Author :
Hafpenny, D.R. ; Kane, D.M. ; Lamb, R.N. ; Gong, B.
Author_Institution :
Sch. of Math., Phys. Comput. & Electron., Macquarie Univ., North Ryde, NSW, Australia
Abstract :
By using the ultraviolet irradiation from a frequency doubled copper vapour laser, in the fluence range used for laser cleaning, the surface chemistry of silica can be modified. Analysis has shown that the surface is dehydroxylated by the UV light changing it from hydrophilic to hydrophobic in nature. The modification of the surface has the effect of reducing the number of particles that adhere to the treated surface by up to 80%, for 0.3 μm diameter particles, upon subsequent contamination of the surface
Keywords :
adhesion; glass; laser materials processing; silicon compounds; surface chemistry; surface cleaning; surface contamination; 0.3 mum; SiO2; adhesion resistant silica glass surfaces; fluence range; frequency doubled Cu vapour laser; hydrophilic surface; hydrophobic surface; surface chemistry; surface contamination; surface dehydroxylation; ultraviolet irradiation; ultraviolet laser cleaning; Adhesives; Chemical lasers; Cleaning; Copper; Frequency; Glass; Silicon compounds; Surface contamination; Surface emitting lasers; Surface treatment;
Conference_Titel :
Optoelectronic and Microelectronic Materials And Devices Proceedings, 1996 Conference on
Conference_Location :
Canberra, ACT
Print_ISBN :
0-7803-3374-8
DOI :
10.1109/COMMAD.1996.610168
