Title :
Probing electric fields in semiconductor devices using electric field induced second harmonic generation
Author :
Peterson, K.A. ; Kane, D.J.
Author_Institution :
Southwest Sci. Inc., Santa Fe, NM, USA
Abstract :
We observe electric field induced second harmonic generation in a GaN based UV diode laser. The scattered second harmonic is collected and measured as a function of bias voltage and incident laser power. We observe bulk electric field induced second harmonic generation from the active region of a GaN UV diode laser (Nichia). By probing at one half the bandgap using a Ti:sapphire laser, we can still take advantage of resonant enhancement of the semiconductor bandgap while reducing absorption (invasiveness) and allowing penetration into the device. Ultimately, we hope to use this technique to probe silicon-based integrated circuits using infrared light.
Keywords :
III-V semiconductors; electro-optical effects; gallium compounds; integrated circuit testing; optical harmonic generation; optical testing; semiconductor device testing; semiconductor lasers; EFISH; GaN; GaN UV diode laser; GaN based UV diode laser; IR light probing; Ti:sapphire laser; active region; bias voltage; bulk electric field induced second harmonic generation; electric field induced second harmonic generation; electric field probing; incident laser power; resonant enhancement; scattered second harmonic; semiconductor bandgap; semiconductor devices; silicon-based integrated circuits; Diode lasers; Frequency conversion; Gallium nitride; Photonic band gap; Power measurement; Power system harmonics; Resonance light scattering; Semiconductor devices; Semiconductor lasers; Voltage;
Conference_Titel :
Nonlinear Optics: Materials, Fundamentals, and Applications, 2000. Technical Digest
Conference_Location :
Kaua´i-Lihue, HI, USA
Print_ISBN :
1-55752-646-X
DOI :
10.1109/NLO.2000.883564