DocumentCode :
2624162
Title :
RF performance degradation in pMOS transistors due to hot carrier and soft breakdown effects
Author :
Liu, Yi ; Sadat, Anwar ; Yu, Chuanzhao ; Yuan, J.S.
Author_Institution :
Dept. of Electr. Eng., Central Florida Univ., Orlando, FL, USA
fYear :
2004
fDate :
8-10 Sept. 2004
Firstpage :
309
Lastpage :
310
Abstract :
Hot carrier and soft breakdown stress on pMOS RF devices has been examined. The cut-off frequency and the S-parameters degrade with stress. The measured threshold voltage shifts negatively and mobility decreases after stress. It is our understanding that this is the first attempt to investigate hot carrier and soft breakdown effects on RF performance of pMOS transistors and first reporting of negative shift in threshold voltage.
Keywords :
MOSFET; S-parameters; carrier mobility; hot carriers; microwave transistors; semiconductor device breakdown; 0 to 10 GHz; RF performance degradation; S-parameters; cut-off frequency; hot carrier stress; mobility; pMOS transistors; soft breakdown stress; threshold voltage; Cutoff frequency; Degradation; Electric breakdown; Hot carriers; MOSFETs; Radio frequency; Scattering parameters; Stress; Threshold voltage; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems, 2004. Digest of Papers. 2004 Topical Meeting on
Print_ISBN :
0-7803-8703-1
Type :
conf
DOI :
10.1109/SMIC.2004.1398231
Filename :
1398231
Link To Document :
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