Title :
Optimizing the design of photorefractive MQW devices
Author :
Garmire, E. ; Abeeluck, A.K.
Author_Institution :
Thayer Sch. of Eng., Dartmouth Coll., Hanover, NH, USA
Abstract :
A study of tradeoffs in device design to maximize diffraction efficiency, sensitivity and resolution, based on an analytical model for device resolution that includes limitations from photocarrier drift. Extended to distributed photorefractive devices.
Keywords :
optical design techniques; optimisation; photoconducting devices; photorefractive effect; semiconductor quantum wells; analytical model; distributed photorefractive devices; maximize diffraction efficiency; photocarrier drift; photorefractive MQW device design optimisation; resolution; sensitivity; Design optimization; Diffraction; Gratings; Holographic optical components; Optical computing; Optical interferometry; Optical sensors; Optical signal processing; Photorefractive effect; Quantum well devices;
Conference_Titel :
Nonlinear Optics: Materials, Fundamentals, and Applications, 2000. Technical Digest
Conference_Location :
Kaua´i-Lihue, HI, USA
Print_ISBN :
1-55752-646-X
DOI :
10.1109/NLO.2000.883684
