DocumentCode
2625100
Title
Optimizing the design of photorefractive MQW devices
Author
Garmire, E. ; Abeeluck, A.K.
Author_Institution
Thayer Sch. of Eng., Dartmouth Coll., Hanover, NH, USA
fYear
2000
fDate
6-10 Aug. 2000
Firstpage
385
Lastpage
387
Abstract
A study of tradeoffs in device design to maximize diffraction efficiency, sensitivity and resolution, based on an analytical model for device resolution that includes limitations from photocarrier drift. Extended to distributed photorefractive devices.
Keywords
optical design techniques; optimisation; photoconducting devices; photorefractive effect; semiconductor quantum wells; analytical model; distributed photorefractive devices; maximize diffraction efficiency; photocarrier drift; photorefractive MQW device design optimisation; resolution; sensitivity; Design optimization; Diffraction; Gratings; Holographic optical components; Optical computing; Optical interferometry; Optical sensors; Optical signal processing; Photorefractive effect; Quantum well devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Nonlinear Optics: Materials, Fundamentals, and Applications, 2000. Technical Digest
Conference_Location
Kaua´i-Lihue, HI, USA
Print_ISBN
1-55752-646-X
Type
conf
DOI
10.1109/NLO.2000.883684
Filename
883684
Link To Document