Title :
Efficient fiber to SOI photonic wire coupler fabricated using standard CMOS technology
Author :
Roelkens, G. ; Dumon, P. ; Bogaerts, W. ; Van Thourhout, D. ; Baets, R.
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Belgium
Abstract :
We present a silicon-on-insulator spot size converter fabricated using 248 nm deep UV lithography. The loss of the taper structure is around 1 dB over more than 60 nm in wavelength range while the overall coupling loss from a lensed fiber into a 590 nm wide SOI waveguide was measured to be 1.9 dB.
Keywords :
CMOS integrated circuits; optical fibre couplers; optical fibre fabrication; optical fibre losses; silicon-on-insulator; ultraviolet lithography; 1 dB; 248 nm; SOI photonic wire coupler; coupling loss; deep UV lithography; lensed fiber; silicon-on-insulator spot size converter; standard CMOS technology; CMOS technology; Optical fiber couplers; Optical fiber devices; Optical refraction; Optical variables control; Optical waveguides; Photonics; Polymers; Silicon on insulator technology; Wire;
Conference_Titel :
Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE
Print_ISBN :
0-7803-9217-5
DOI :
10.1109/LEOS.2005.1547946
