• DocumentCode
    2632237
  • Title

    The optical properties of gold nanocluster composites in silica formed by ion beam assisted deposition

  • Author

    Stroud, R.M. ; Schiestel, S. ; Melinger, J.S. ; Carosell, C.A. ; Knies, D.L.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • fYear
    1998
  • fDate
    10-14 Aug 1998
  • Firstpage
    75
  • Lastpage
    77
  • Abstract
    Describes the linear and nonlinear optical (NLO) properties of thin films of gold nanoclusters in silica matrices, produced by a technique called ion beam assisted deposition (IBAD). IBAD has achieved a significant amount of application in the optical thin-film industry due mainly to the fact that IBAD films are denser than evaporated or sputtered films. We have used the technique in recent years to produce metal and semiconductor nanoclusters embedded in dielectric matrices. Metal nanocluster thin film consisting of clusters 5-30 nm in size embedded in an active metal oxide matrix were deposited by co-evaporation of two metals, one more highly reactive toward oxygen than the other, with O2+ ion bombardment. We have also produced nanoclusters in dielectrics by co-evaporation of a metal and a dielectric. Here the ion beam (e.g. argon) is used to control the microstructure of the nanoclusters and to densify the films. Values of χ(3)/α (where α is the absorption coefficient) for the IBAD films were as good as or even superior to those reported for ion implanted film. The advantages of the IBAD method for fabricating films with NLO properties include the ability to deposit films with greater active region thicknesses, higher nanocluster densities and more uniformly sized nanoclusters
  • Keywords
    absorption coefficients; atomic clusters; gold; ion beam assisted deposition; metal clusters; metallic thin films; multiwave mixing; nanostructured materials; nonlinear optical susceptibility; nonlinear optics; optical films; χ(3); 5 to 30 nm; Au; Au nanocluster composites; O2; O2+ ion bombardment; SiO2; SiO2-Au; absorption coefficient; active metal oxide matrix; active region thickness; co-evaporation; densification; dielectric matrices; fabrication; ion beam assisted deposition; ion implanted film; linear optical properties; metal nanocluster thin film; microstructure; nanocluster densities; nonlinear optical properties; optical properties; optical thin-film industry; silica; thin films; uniformly sized nanoclusters; Dielectric thin films; Gold; Ion beams; Nonlinear optics; Optical films; Particle beam optics; Semiconductor films; Semiconductor thin films; Silicon compounds; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nonlinear Optics '98: Materials, Fundamentals and Applications Topical Meeting
  • Conference_Location
    Kauai, HI
  • Print_ISBN
    0-7803-4950-4
  • Type

    conf

  • DOI
    10.1109/NLO.1998.710185
  • Filename
    710185