DocumentCode
2632237
Title
The optical properties of gold nanocluster composites in silica formed by ion beam assisted deposition
Author
Stroud, R.M. ; Schiestel, S. ; Melinger, J.S. ; Carosell, C.A. ; Knies, D.L.
Author_Institution
Naval Res. Lab., Washington, DC, USA
fYear
1998
fDate
10-14 Aug 1998
Firstpage
75
Lastpage
77
Abstract
Describes the linear and nonlinear optical (NLO) properties of thin films of gold nanoclusters in silica matrices, produced by a technique called ion beam assisted deposition (IBAD). IBAD has achieved a significant amount of application in the optical thin-film industry due mainly to the fact that IBAD films are denser than evaporated or sputtered films. We have used the technique in recent years to produce metal and semiconductor nanoclusters embedded in dielectric matrices. Metal nanocluster thin film consisting of clusters 5-30 nm in size embedded in an active metal oxide matrix were deposited by co-evaporation of two metals, one more highly reactive toward oxygen than the other, with O2+ ion bombardment. We have also produced nanoclusters in dielectrics by co-evaporation of a metal and a dielectric. Here the ion beam (e.g. argon) is used to control the microstructure of the nanoclusters and to densify the films. Values of χ(3)/α (where α is the absorption coefficient) for the IBAD films were as good as or even superior to those reported for ion implanted film. The advantages of the IBAD method for fabricating films with NLO properties include the ability to deposit films with greater active region thicknesses, higher nanocluster densities and more uniformly sized nanoclusters
Keywords
absorption coefficients; atomic clusters; gold; ion beam assisted deposition; metal clusters; metallic thin films; multiwave mixing; nanostructured materials; nonlinear optical susceptibility; nonlinear optics; optical films; χ(3); 5 to 30 nm; Au; Au nanocluster composites; O2; O2+ ion bombardment; SiO2; SiO2-Au; absorption coefficient; active metal oxide matrix; active region thickness; co-evaporation; densification; dielectric matrices; fabrication; ion beam assisted deposition; ion implanted film; linear optical properties; metal nanocluster thin film; microstructure; nanocluster densities; nonlinear optical properties; optical properties; optical thin-film industry; silica; thin films; uniformly sized nanoclusters; Dielectric thin films; Gold; Ion beams; Nonlinear optics; Optical films; Particle beam optics; Semiconductor films; Semiconductor thin films; Silicon compounds; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Nonlinear Optics '98: Materials, Fundamentals and Applications Topical Meeting
Conference_Location
Kauai, HI
Print_ISBN
0-7803-4950-4
Type
conf
DOI
10.1109/NLO.1998.710185
Filename
710185
Link To Document