Highly tunable photonic band gap in inverse shell non-close-packed structures

Author

Gaillot, Davy P. ; Graugnard, Elton D. ; King, Jeffrey S. ; Summers, Christopher J.

Author_Institution

Sch. of Mater. Sci. & Eng., Georgia Inst. of Technol., Atlanta, GA

fYear

2005

fDate

22-22 Oct. 2005

Firstpage

404

Lastpage

405

Abstract

Using 3D-FDTD computations, photonic band gap properties of materials which can be fabricated by an innovative atomic layer deposition (ALD) technique was presented. Non-sintered synthetic opal was conformally infiltrated with a buffer material that can be selectively etched, and a high refractive index material subsequently infiltrated onto the buffer layer up to the maximum infiltration of 86%. After complete chemical removal of the dielectric spheres and sacrificial layer, the inverse structure can be backfilled so that a high refractive index material conforms to the interior geometry of the remaining backbone

Keywords

atomic layer deposition; etching; finite difference time-domain analysis; optical fabrication; optical materials; optical tuning; photonic band gap; refractive index; 3D-FDTD; atomic layer deposition; infiltration; inverse shell; nonclose-packed structures; nonsintered synthetic opal; refractive index; selective etching; tunable photonic band gap; Atomic layer deposition; Buffer layers; Chemicals; Dielectric materials; Etching; Geometry; Optical computing; Photonic band gap; Refractive index; Spine;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE

Conference_Location

Sydney, NSW

Print_ISBN

0-7803-9217-5

Type

conf

DOI

10.1109/LEOS.2005.1548041

Filename

1548041