• DocumentCode
    2633434
  • Title

    Exploration of VLSI CAD researches for early design rule evaluation

  • Author

    Park, Chul-Hong ; Pan, David Z. ; Lucas, Kevin

  • Author_Institution
    Semicond. R&D Center, Samsung Electron., Yongin, South Korea
  • fYear
    2011
  • fDate
    25-28 Jan. 2011
  • Firstpage
    405
  • Lastpage
    406
  • Abstract
    Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer´s role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches for early and systematic evaluation of design rule, which will be a key technique for enhancing the competitiveness in IC market.
  • Keywords
    VLSI; lithography; technology CAD (electronics); VLSI CAD; design rule evaluation; lithography; Design automation; Layout; Lithography; Performance evaluation; Routing; Solid modeling; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design Automation Conference (ASP-DAC), 2011 16th Asia and South Pacific
  • Conference_Location
    Yokohama
  • ISSN
    2153-6961
  • Print_ISBN
    978-1-4244-7515-5
  • Type

    conf

  • DOI
    10.1109/ASPDAC.2011.5722223
  • Filename
    5722223