DocumentCode
2633434
Title
Exploration of VLSI CAD researches for early design rule evaluation
Author
Park, Chul-Hong ; Pan, David Z. ; Lucas, Kevin
Author_Institution
Semicond. R&D Center, Samsung Electron., Yongin, South Korea
fYear
2011
fDate
25-28 Jan. 2011
Firstpage
405
Lastpage
406
Abstract
Design rule has been a primary metric to link design and technology, and is likely to be considered as IC manufacturer´s role for the generation due to the empirical and unsystematic in nature. Disruptive and radical changes in terms of layout style, lithography and device in the next decade require the design rule evaluation in early development stage. In this paper, we explore VLSI CAD researches for early and systematic evaluation of design rule, which will be a key technique for enhancing the competitiveness in IC market.
Keywords
VLSI; lithography; technology CAD (electronics); VLSI CAD; design rule evaluation; lithography; Design automation; Layout; Lithography; Performance evaluation; Routing; Solid modeling; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference (ASP-DAC), 2011 16th Asia and South Pacific
Conference_Location
Yokohama
ISSN
2153-6961
Print_ISBN
978-1-4244-7515-5
Type
conf
DOI
10.1109/ASPDAC.2011.5722223
Filename
5722223
Link To Document