DocumentCode
2633458
Title
An analysis Of the benefits of NBTI recovery under circuit operating conditions
Author
Kufluoglu, Haldun ; Chancellor, C. ; Chen, M. ; Reddy, V.
Author_Institution
TDI, Texas Instrum., Dallas, TX, USA
fYear
2012
fDate
15-19 April 2012
Abstract
A simple but powerful and efficient NBTI recovery model is presented. Calibration is performed with a wide set of stress and recovery sequences measured under various voltages. The model provides easy-to-use tools for analytical representation of NBTI behavior as well as compatibility for sophisticated circuit reliability simulations. Regarding circuit operation and transistor characterization, the model implies higher permanent damage and thus, less recoverable NBTI degradation as the VDD is increased. Furthermore, the activity of the transistors inside a circuit becomes very critical to understand the impact of recovery. The duty cycle and frequency trends are not sufficient to judge for the amount of circuit-level aging. Even the circuit topology contributes to the final degradation, and therefore recovery should be analyzed within the context of the circuit applications.
Keywords
integrated circuit reliability; integrated circuit testing; NBTI degradation; NBTI recovery; calibration; circuit operating condition; circuit reliability; circuit topology; circuit-level aging; duty cycle; frequency trend; transistor characterization; Calibration; Computational modeling; Data models; Degradation; Integrated circuit modeling; Stress; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium (IRPS), 2012 IEEE International
Conference_Location
Anaheim, CA
ISSN
1541-7026
Print_ISBN
978-1-4577-1678-2
Electronic_ISBN
1541-7026
Type
conf
DOI
10.1109/IRPS.2012.6241796
Filename
6241796
Link To Document