Title :
A shallow-etched multilayer grating-based wavelength demultiplexer in SOI
Author :
Bisaillon, Eric ; Laniel, Jacques ; Jugessur, Aju ; Kirk, Andrew G.
Author_Institution :
Electr. & Comput. Eng., McGill Univ., Montreal, Que.
Abstract :
A very shallow multilayer etched-grating is proposed as a wavelength demultiplexer. Two different configurations are compared for diffraction efficiency and resolution. Single-step-etch fabrication designs are presented and modeled for their grating efficiency and overall performance
Keywords :
demultiplexing equipment; diffraction gratings; etching; optical communication equipment; optical fabrication; optical multilayers; silicon-on-insulator; SOI; diffraction efficiency; fabrication designs; multilayer grating; shallow etching; wavelength demultiplexer; Arrayed waveguide gratings; Diffraction gratings; Etching; Fabrication; Kirk field collapse effect; Nonhomogeneous media; Optical propagation; Phased arrays; Slabs; Wavelength division multiplexing;
Conference_Titel :
Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE
Conference_Location :
Sydney, NSW
Print_ISBN :
0-7803-9217-5
DOI :
10.1109/LEOS.2005.1548146
