DocumentCode
2635156
Title
A shallow-etched multilayer grating-based wavelength demultiplexer in SOI
Author
Bisaillon, Eric ; Laniel, Jacques ; Jugessur, Aju ; Kirk, Andrew G.
Author_Institution
Electr. & Comput. Eng., McGill Univ., Montreal, Que.
fYear
2005
fDate
22-22 Oct. 2005
Firstpage
612
Lastpage
613
Abstract
A very shallow multilayer etched-grating is proposed as a wavelength demultiplexer. Two different configurations are compared for diffraction efficiency and resolution. Single-step-etch fabrication designs are presented and modeled for their grating efficiency and overall performance
Keywords
demultiplexing equipment; diffraction gratings; etching; optical communication equipment; optical fabrication; optical multilayers; silicon-on-insulator; SOI; diffraction efficiency; fabrication designs; multilayer grating; shallow etching; wavelength demultiplexer; Arrayed waveguide gratings; Diffraction gratings; Etching; Fabrication; Kirk field collapse effect; Nonhomogeneous media; Optical propagation; Phased arrays; Slabs; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2005. LEOS 2005. The 18th Annual Meeting of the IEEE
Conference_Location
Sydney, NSW
Print_ISBN
0-7803-9217-5
Type
conf
DOI
10.1109/LEOS.2005.1548146
Filename
1548146
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