Title :
Oxide-coated polysilicon disk resonator gyroscope (DRG) within the wafer-scale encapsulation process
Author :
Ahn, C.H. ; Ng, E. ; Hong, V.A. ; Huynh, J. ; Kenny, T.W. ; Wang, S.
Author_Institution :
Mech. Eng. Dept., Stanford Univ., Stanford, CA, USA
Abstract :
This paper reports fabrication and preliminary test results of oxide-coated polysilicon disk resonator gyroscopes (DRG) in a wafer-scale encapsulation. With this thin oxide coating, surface roughness of a fully encapsulated device was reduced by 10 × increasing the uniformity across the wafer. We also demonstrate the effects of oxide coating on key performance parameters of resonant-based sensors such as temperature coefficient of frequency (TCF) and quality factor (Q). Preliminary results show more than 30% increase in Q (75k) at 217 kHz resonant frequency.
Keywords :
coating techniques; elemental semiconductors; encapsulation; gyroscopes; microfabrication; micromechanical resonators; microsensors; silicon; surface roughness; DRG fabrication; Si; frequency 217 kHz; oxide coated polysilicon disk resonator gyroscope; quality factor; resonant based sensors; surface roughness; temperature coefficient of frequency; wafer scale encapsulation process; Coatings; Fabrication; Gyroscopes; Q-factor; Rough surfaces; Surface roughness; Surface treatment; Disk Resonator Gyroscope; MEMS; Oxide-coating; Polysilicon; Surface roughness;
Conference_Titel :
Inertial Sensors and Systems (ISISS), 2015 IEEE International Symposium on
Conference_Location :
Hapuna Beach, HI
DOI :
10.1109/ISISS.2015.7102392
